KATARI, M. . The Impact of Extreme Ultraviolet Lithography (EUVL) on Semiconductor Scaling. Journal of Artificial Intelligence General science (JAIGS) ISSN:3006-4023, [S. l.], v. 2, n. 1, p. 248–261, 2024. DOI: 10.60087/jaigs.v2i1.190. Disponível em: https://ojs.boulibrary.com/index.php/JAIGS/article/view/190. Acesso em: 18 sep. 2024.