KATARI, M. . Optimization of Atomic Layer Deposition Processes for Enhanced Semiconductor Performance. Journal of Artificial Intelligence General science (JAIGS) ISSN:3006-4023, [S. l.], v. 1, n. 1, p. 245–257, 2024. DOI: 10.60087/jaigs.v1i1.192. Disponível em: https://ojs.boulibrary.com/index.php/JAIGS/article/view/192. Acesso em: 18 sep. 2024.